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CARBONLETT, vol. 24, no. 1, pp.55-61, 2017

DOI: http://dx.doi.org/I:10.5714/CL.2017.24.055

Preparation of photoresist-derived carbon micropatterns by proton ion beam lithography and pyrolysis

Hui-Gyun Nam1, Jin-Mook Jung1, In-Tae Hwang2, Junhwa Shin2, Chang-Hee Jung2,♠ and Jae-Hak Choi1,♠

Affiliation: 1Department of Polymer Science and Engineering, Chungnam National University, Daejeon 34134, Korea
2Research Division for Industry and Environment, Korea Atomic Energy Research Institute, Jeongeup 56212, Korea

Abstract: Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×1015 ions cm-2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×102 S cm-1 and a very low surface roughness.


Keyword: carbon micropatterns, SU-8 photoresist, proton ion beam lithography, pyrolysis