CARBONLETT, vol. 24, no. 1, pp.55-61, 2017

DOI: http://dx.doi.org/I:10.5714/CL.2017.24.055

Preparation of photoresist-derived carbon micropatterns by proton ion beam lithography and pyrolysis

Hui-Gyun Nam1, Jin-Mook Jung¹, In-Tae Hwang², Junhwa Shin², Chang-Hee Jung^2,â™  and Jae-Hak Choi^1,â™ 

Affiliation: ¹Department of Polymer Science and Engineering, Chungnam National University, Daejeon 34134, Korea
²Research Division for Industry and Environment, Korea Atomic Energy Research Institute, Jeongeup 56212, Korea

Abstract: Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×10¹⁵ ions cm^-2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×10² S cm^-1 and a very low surface roughness.

Keyword: carbon micropatterns, SU-8 photoresist, proton ion beam lithography, pyrolysis