pISSN: 1976-4251
eISSN: 2233-4998
About the Journal
Editorial Committee
Information for Authors
Associated Editors
Editorial Office
Current Issues
Article In Press
Search for Archives
Subject   Keyword   Abstract   Author  

CARBONLETT, vol. 24, no. 1, pp.55-61, 2017

DOI: http://dx.doi.org/I:10.5714/CL.2017.24.055

Preparation of photoresist-derived carbon micropatterns by proton ion beam lithography and pyrolysis

Hui-Gyun Nam1, Jin-Mook Jung1, In-Tae Hwang2, Junhwa Shin2, Chang-Hee Jung2,♠ and Jae-Hak Choi1,♠

Affiliation: 1Department of Polymer Science and Engineering, Chungnam National University, Daejeon 34134, Korea
2Research Division for Industry and Environment, Korea Atomic Energy Research Institute, Jeongeup 56212, Korea

Abstract: Carbon micropatterns (CMs) were fabricated from a negative-type SU-8 photoresist by proton ion beam lithography and pyrolysis. Well-defined negative-type SU-8 micropatterns were formed by proton ion beam lithography at the optimized fluence of 1×1015 ions cm-2 and then pyrolyzed to form CMs. The crosslinked network structures formed by proton irradiation were converted to pseudo-graphitic structures by pyrolysis. The fabricated CMs showed a good electrical conductivity of 1.58×102 S cm-1 and a very low surface roughness.

Keyword: carbon micropatterns, SU-8 photoresist, proton ion beam lithography, pyrolysis